Allied Market Research

Extreme Ultraviolet Lithography (EUVL) Systems Market Expected to Reach $1,195 Million, Globally, by 2022


quote Efficient execution of EUVL technology is anticipated to enable it to replace other optical lithography techniques over the course of next few years. By using these nanotechnology semiconductors manufacturers will be able to get compact electronics chips with less power requirements. quote

Preeti Bisht
Sr. Research Associate, Semiconductor and Electronics at Allied Market Research

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According to a new report published by Allied Market Research, titled; "Extreme Ultraviolet Lithography (EUVL) Systems Market by Type, by Light Source, Equipment, and Application: Global Opportunity Analysis and Industry Forecast, 2014-2022," the extreme ultraviolet lithography (EUVL) systems market was valued at $650 million in 2015 and is projected to reach $1,195 million by 2022, growing at a CAGR of 9.2% from 2016 to 2022. The laser-produced plasmas segment held major share in the total market in 2015.

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Extreme ultraviolet lithography (EUVL) is a modern process for fabricating microprocessors, which are hundred times more efficient than the current ones available in the market. This technology allows storage of more information. EUVL replaces other optical lithography techniques, currently used to fabricate microcircuits, which we use in our devices.

Factors that assist the market growth include ability of the EUVL system to offer enhanced resolving power and high productivity. However, EUVL is a complex technology that requires all new step-and-scan systems for production of semiconductors, which restricts the market growth. Reduction in size of transistors and electronic circuits within microprocessors increases the density and power of these systems, expected to provide lucrative opportunity for the market growth.

Based on light source, laser-produced plasmas contributed the largest revenue share in the market in 2015. Owing to their advantages such as short-pulse and high average power laser beam than other sources. However, over the next few years, vacuum spark segment is anticipated to be one of the fastest growing light source in terms of revenue in the global extreme ultraviolet lithography system market.

Memory segment dominated with more than 40% share in EUVL systems market, in 2015. The other optical lithography techniques, which are currently prevalent have several limitations, such as storage space constraint, large size, and low data transmission speed. Advent of EUVL systems have removed these limitations. The new systems feature very high speed and large storage space. The rise in sale of electronic devices and increase in trend of internet of things (IoT), which require large space, are anticipated to create a huge demand in EUVL system market for big storage systems.

Key Findings of the Extreme Ultraviolet Lithography (EUVL) Systems Market

  • In terms of revenue, laser-produced plasmas held over 45% of the share in EUVL systems market.
  • In 2015, the light source dominated with over 50% share in the market and is expected to be one of the fastest growing segments in the market.
  • In 2015, memory application held over 40% of share in EUVL systems market which was the highest among all the applications.
  • Asia-Pacific is estimated to continue dominating the market in the coming years. In 2015, the region accounted for about 60% share across all the geographical regions.

In 2015, Asia-Pacific accounted for over half of the total EUVL systems market and is expected to retain its dominant position owing to the presence of several emerging nations with high share in the consumer electronics market, well-established semiconductor industry, and presence of key market players.

The major companies profiled in the report include ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc., and Vistec Semiconductor Systems.

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quote Extreme Ultraviolet Lithography (EUVL) Systems Market by Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Tool (Light Source, Mirrors, Mask ), and Application (Memory, IDM, Foundry ) - Global Opportunity Analysis and Industry Forecast, 2014 - 2022 quote

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