Extreme Ultraviolet Lithography (EUVL) Systems Market Overview:
Global Extreme Ultraviolet Lithography (EUVL) Systems Market is anticipated to reach around $1,195 million by 2022, growing at a CAGR of 9.2% from 2016 to 2022. Extreme UV lithography is a next generation lithography technology, which uses smallest wavelength to create circuits with small features and obtain an output with better resolution. Lithography is used to print complex patterns that define integrated circuits onto semiconductor wafers. EUV lithography (EUVL) is one of the leading next generation lithography (NGL) technologies. Discharge-produced plasma (DPP) and laser-produced plasma (LPP) are the prominent technologies used to produce high power EUV radiation.
Using EUVL, we can get compact electronic chips with less power requirements. The technology features enhanced resolving power and is cost-effective. Therefore, the global extreme ultraviolet lithography (EUVL) systems market is expected to witness moderate growth in the near future. However, limited acceptance and risk of unknown technical flaws are estimated to hamper the market growth. Also, projection lithography is projected to remain semiconductor industry’s pattern technology of choice for years to come owing to successful installation of EUVL.
The global EUVL systems market is segmented based on light source, tool, end user, and geography. The light source segment is divided into laser produced plasmas (LPP), vacuum sparks, and gas discharges. In 2015, LPP dominated the global market in terms of revenue, and is expected to maintain this trend throughout the forecast period, owing to its reliability.
On the basis of equipment, the market is categorized into light source, mirrors, masks, and others. The mirrors segment dominated the global market in terms of revenue, and is expected to maintain this trend during the forecast period.
Extreme Ultraviolet Lithography (EUVL) Systems: Applications
Comprehensive competitive analysis and profiles of major market players, including ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc., and Vistec Semiconductor Systems are provided in this report.
Drivers & Restraint
- The study provides an in-depth analysis of the global EUVL systems market to elucidate the prominent investment pockets.
- Current trends and future estimations are outlined to determine the overall potential, and single out profitable trends to gain a stronger foothold in the market.
- The report provides impact analysis and information regarding key drivers, restraints, and opportunities.
- The market is analyzed based on various regions, namely, North America, Europe, Asia-Pacific, and LAMEA.
Extreme Ultraviolet Lithography (EUVL) Systems Market Key Segments:
By Light Source
- Laser Produced Plasmas (LPP)
- Vacuum Sparks
- Gas Discharges
- Light Source
- North America
- Rest of Europe
- Rest of Asia-Pacific
- Latin America
- Middle East