Extreme Ultraviolet Lithography (EUVL) Systems Market Research, 2031
The global extreme ultraviolet lithography (EUVL) systems market size was valued at $8.0 billion in 2021 and is projected to reach $77.1 billion by 2031, growing at a CAGR of 25.1% from 2022 to 2031.
Extreme ultraviolet lithography (EUVL) is one of the leading next-generation lithography (NGL) technologies used to print lines as small as 30nm and develop microprocessors and microchips. This technology may replace optical lithography, which is used to device present-day microcircuits. The EUVL system works by burning strong beams of ultraviolet light that are reflected from a circuit design pattern into a silicon wafer.
Further, extreme ultraviolet lithography systems are an extremely short wavelength technology that can be applied up to 10nm node. However, three concerns must be addressed before this approach can be mass-produced—a light power source, resistance, and mask infrastructure.
The EUVL systems market is expected to witness notable growth during the forecast period, owing to technological superiority over other lithography techniques. Furthermore, the imminent requirement for size contraction in electronic devices is expected to drive the growth of the extreme ultraviolet lithography systems market outlook. Moreover, a rise in the sale of microelectronics devices is expected to propel the growth of the extreme ultraviolet lithography systems market growth during the forecast period.
However, complexities in developing proper photoresists and challenges in making the perfect mask are some of the prime factors that restrain the market growth. On the contrary, the rise in trends of the Internet of Things is expected to provide lucrative opportunities for the growth of the EUVL systems market during the forecast period.
The outbreak of COVID-19 has significantly impacted the growth of the extreme ultraviolet lithography systems market forecast in 2020, owing to a significant impact on prime players operating in the supply chain. However, the rise in demand for Internet of Things solutions across prime sectors is one of the major factors that propel the market growth during the COVID-19 pandemic. On the contrary, the market was principally hit by several obstacles amid the COVID-19 pandemic, such as a lack of skilled workforce availability and delay or cancelation of projects due to partial or complete lockdown, globally. Furthermore, the surge in adoption of microelectronic devices across prime economies is expected to strengthen the extreme ultraviolet lithography systems market opportunity post-COVID-19.
Competitive analysis and profiles of the major extreme ultraviolet lithography systems market players, such as ASML, Canon, and Nikon are provided in this report.
The extreme ultraviolet lithography (euvl) systems market is segmented into By Light sources, By Equipment, and By Region.
By Equipment
Light Source segment hold domination position in 2021.
On the basis of equipment, the extreme ultraviolet lithography systems market Sizeis divided into light sources, mirrors, helmets, and others. The light source segment dominated the market, in terms of revenue, in 2020, and is expected to follow the same trend during the forecast period.
By Light Source
Stereoscopic segment influence the market in 2021, and expected to follow the same in future.
On the basis of the light sources, the extreme ultraviolet lithography systems market analysis is divided into laser produce plasmas (LPP), vacuum sparks, and gas discharges. The laser produces plasmas segment acquired the largest extreme ultraviolet lithography systems market share in 2021. However, the vacuum sparks segment is expected to grow at a high CAGR from 2022 to 2031.
Region-wise, the extreme ultraviolet lithography systems market trends are analyzed across North America (the U.S., Canada, and Mexico), Europe (the UK, Germany, France, and the rest of Europe), Asia-Pacific (China, India, Japan, and the rest of the Asia-Pacific), and LAMEA (Latin America, the Middle East, and Africa). Asia-Pacific, specifically China remains a significant participant in the global extreme ultraviolet lithography systems industry. Major organizations and government institutions in the country are intensely putting resources into the technology.
Key Benefits For Stakeholders
- This report provides a quantitative analysis of the market segments, current trends, estimations, and dynamics of the extreme ultraviolet lithography (euvl) systems market analysis from 2021 to 2031 to identify the prevailing extreme ultraviolet lithography (euvl) systems market opportunities.
- Market research is offered along with information related to key drivers, restraints, and opportunities.
- Porter's five forces analysis highlights the potency of buyers and suppliers to enable stakeholders to make profit-oriented business decisions and strengthen their supplier-buyer network.
- In-depth analysis of the extreme ultraviolet lithography (euvl) systems market segmentation assists to determine the prevailing market opportunities.
- Major countries in each region are mapped according to their revenue contribution to the global market.
- Market player positioning facilitates benchmarking and provides a clear understanding of the present position of the market players.
- The report includes the analysis of the regional as well as global extreme ultraviolet lithography (euvl) systems market trends, key players, market segments, application areas, and market growth strategies.
Extreme Ultraviolet Lithography (EUVL) Systems Market Report Highlights
| Aspects | Details |
 By Light Source |
|
 By Equipment |
|
 By Region |
|
 Key Market Players | CANNON INC., NIKON CORPORATION, ASML |
Analyst Review
Extreme ultraviolet lithography (EUVL) is a cutting-edge technology for manufacturing microprocessors, which are several times more efficient than the ones currently available in the market. Leading players in the market such as Intel, AMD, and Motorola have joined with the U.S. Department of Energy in a three-year project to fabricate a microchip with etched circuit lines lesser than 0.1 micron in width. A microprocessor made with the EUVL technology is expected to be several times more powerful than the microprocessors being used currently. This technology will increase the storage space. EUVL strives to replace the other optical lithography techniques used currently to fabricate microcircuits, which are used in devices. EUVL is similar to optical lithography, in which light is deflected through camera lenses onto the wafer. However, extreme ultraviolet light functions at a different wavelength, has different properties and must be reflected from mirrors instead of refracted from lenses. The challenge is to shape mirrors perfectly so that they can reflect the light with adequate precision. Intel is researching some early prototypes for the same.
Laser-produced plasmas, which feature short-pulse and high average power laser beam, dominate the extreme ultraviolet lithography systems. However, over the next few years, vacuum spark is anticipated to be one of the fastest growing light sources in terms of revenue.
The EUVL market in the Asia-Pacific region has the largest share across all the geographies due to the presence of developing countries that have a prosperous consumer electronics market and a clear dominance in the semiconductor market. Furthermore, the North America extreme ultraviolet lithography market size is anticipated to grow very rapidly in the years to come, due to several government initiatives and presence of key players, which invest heavily in R&D.
Asia-Pacific contributed for the major share in the extreme ultraviolet lithography systems market in 2021.
The light source segment accounted for maximum revenue and is projected to grow at a notable CAGR of 25.9% during the forecast period.
Technological superiority over other lithography techniques and the Imminent requirement for size contraction in electronic devices are the upcoming trends of the Extreme Ultraviolet Lithography (EUVL) Systems Market in the world.
The extreme ultraviolet lithography systems market was valued at $8.04 billion in 2021 and is projected to reach $77.07 billion by 2031.
ASML, Canon, and Nikon hold the major share in EUVL system Market.
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